DFM Dictionary Expanded
This month, DFM terminology contributions for the latest version of the DFM Dictionary were received from seven companies. The new terms added to the dictionary covered the following areas:
• Design Intent
- Meta Information in the Design to manufacturing handoff database that allows manufacturing to optimize for yield/cost/TAT while preserving electrical or functional fidelity.
- Meta Information used at a step in the Design2Silicon flow
in order to : limit the amount of over design/over process and properly
design/process for additional design constraints
• Radical Design Restrictions - RDR
- A design philosophy, methodology, and toolset that dramatically reduces the risk of yield loss not attributable random defects.
- A design philosophy, methodology, and toolset, that Accomplishes yield risk mitigation by reducing the variability in the polygon space relative to historical GR formulations.
- A design philosophy, methodology, and toolset which Specifies known good constructs versus known bad constructs
- A design philosophy, methodology, and toolset which Enables
Design Respin* at improved TAT.
• Systematic Parametric Variation
- Repeatable Deviations in electrical parameters associated
with the physical design (layout) and/or the wafer process.
• Random Parametric Variation
- Non-repeatable Deviations in electrical parameters associated with random wafer process variation.
• Hotspot _ Parametric
- Systematic Parametric Variation which exceeds 10% of the Random variations for the same parameters.
- Systematic Parametric Variation which invalidates the
correlation assumption of design closure resulting in increased yield
loss or increased risk of yield loss.
Following are samples
from recent contributions to the DFM Dictionary
Zernike Polynominals
Anisotropy
Partial Coherence
SRAF Insertion
